Tour 2.0 parallel design reduces grip pressure for a more consistent putter head path
Enhanced Spyne technology with embossed ridge makes squaring the face at impact easier
Multi-zone texturing optimizes feedback and comfort in high-sensory areas
Soft polyurethane outer layer provides exceptional comfort and feel
Tech Port enables easy addition of game improvement options and performance tracking sensors
Summarized by Shop
The Tour 2.0's parallel design offers a consistent lower hand profile to reduce grip pressure, ensuring a steady putter head path for a uniform stroke.
Features Include:
EnhancedSPYNE®Technology – The new SPYNE
® Technology has an improved, embossed ridge along the underside of the grip, engineered to make it easier to square the f